CFY401 UV Reticle Defect Inspection System | productronica Shanghai CFY401 UV Reticle Defect Inspection System,Test and measurement, quality assurance,productronica Shanghai The CFY401 is a dedicated UV-class reticle pattern defect inspection system for mask shops and FAB production lines. Focusing on pattern defect inspection of core areas, it empowers production lines to accurately identify critical flaws that impact chip yield. Equipped with a 360 nm ultraviolet light source and a dual reflective/transmissive optical path design, it supports multiple inspection modes including Die2Die, Die2DB and Starlight, enabling precise detection of various complex pattern defects. The system is compatible with 6025-format reticles and features an automated SMIF Pod loading/unloading solution with auto-opening function, ensuring stable transmission in an ultra-high cleanliness environment. With an inspection capability of 130 nm and an inspection speed of less than 35 minutes per reticle, the CFY401 balances high inspection sensitivity and stability while meeting the stringent requirements for reticle defect monitoring in advanced processes. It helps customers improve the manufacturing yield of both photomasks and chips.
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Product Introduction

CFY401 UV Reticle Defect Inspection System
The CFY401 is a dedicated UV-class reticle pattern defect inspection system for mask shops and FAB production lines. Focusing on pattern defect inspection of core areas, it empowers production lines to accurately identify critical flaws that impact chip yield. Equipped with a 360 nm ultraviolet light source and a dual reflective/transmissive optical path design, it supports multiple inspection modes including Die2Die, Die2DB and Starlight, enabling precise detection of various complex pattern defects. The system is compatible with 6025-format reticles and features an automated SMIF Pod loading/unloading solution with auto-opening function, ensuring stable transmission in an ultra-high cleanliness environment. With an inspection capability of 130 nm and an inspection speed of less than 35 minutes per reticle, the CFY401 balances high inspection sensitivity and stability while meeting the stringent requirements for reticle defect monitoring in advanced processes. It helps customers improve the manufacturing yield of both photomasks and chips.
Conventional Products
Product Category:
Test and measurement, quality assurance
Application Area:
Industrial Electronics

Exhibitor Profile

Zhuhai Chengfeng Electronic Technology Co., Ltd.
珠海诚锋电子科技有限公司
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5750
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