CFY210 Multi-Purpose Reticle Defect Inspection System | productronica Shanghai CFY210 Multi-Purpose Reticle Defect Inspection System,Test and measurement, quality assurance,productronica Shanghai The CFY210 is a multi-purpose defect inspection system specially designed for mask shops and blank manufacturing processes. It covers the entire production processes of blank quartz substrates including coating and photoresist application, as well as defect inspection at the ADI/AEI process stations in mask shops, enabling high-resolution and accurate identification of particle and pinhole defects. It supports two inspection modes: Die2DB and Particle, and adopts optical solutions such as transmission, reflection and scattering. The system is compatible with 6025-format reticles and features automated SMIF Pod loading/unloading with auto-opening function. It is also adaptable to 5-layer transport pods for blank fabs and 6-layer SMIF pods, meeting the transmission requirements of ultra-high cleanliness production environments. Boasting an inspection capability of 200 nm and a maximum inspection speed of 4 minutes per reticle, the CFY210 ensures inspection stability and high throughput while providing reliable support for full-process quality control in photomask manufacturing, helping customers improve yield and reduce production costs.
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Product Introduction

CFY210 Multi-Purpose Reticle Defect Inspection System
The CFY210 is a multi-purpose defect inspection system specially designed for mask shops and blank manufacturing processes. It covers the entire production processes of blank quartz substrates including coating and photoresist application, as well as defect inspection at the ADI/AEI process stations in mask shops, enabling high-resolution and accurate identification of particle and pinhole defects. It supports two inspection modes: Die2DB and Particle, and adopts optical solutions such as transmission, reflection and scattering. The system is compatible with 6025-format reticles and features automated SMIF Pod loading/unloading with auto-opening function. It is also adaptable to 5-layer transport pods for blank fabs and 6-layer SMIF pods, meeting the transmission requirements of ultra-high cleanliness production environments. Boasting an inspection capability of 200 nm and a maximum inspection speed of 4 minutes per reticle, the CFY210 ensures inspection stability and high throughput while providing reliable support for full-process quality control in photomask manufacturing, helping customers improve yield and reduce production costs.
Conventional Products
Product Category:
Test and measurement, quality assurance
Application Area:
Industrial Electronics

Exhibitor Profile

Zhuhai Chengfeng Electronic Technology Co., Ltd.
珠海诚锋电子科技有限公司
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5750
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